Hydrofluoric acid
Used for etching materials of the semiconductor industry (silicon and quartz wafers)
HF is used in integrated circuit technology for the local oxidation of the channel-limiting region.
Product Characteristics:
|
№ |
Name of indicator |
Raw material |
Test results |
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| ТУ 2612-028-6988698-2014 | Sample No. 1 | Sample No. 2 | |||||
|
1 |
Mass fraction of hydrofluoric acid (HF),% |
46-49 |
49 |
49 |
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|
Mass fraction of impurities, not more than: |
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|
% |
ppm | % | ppm | % |
ppm |
||
|
2 |
Al |
3 · 10-6 |
0,03 | 7 · 10-8 | 0,0007 | 2 · 10-8 |
0,0002 |
|
3 |
Ba |
2 · 10-6 |
0,02 | 1 · 10-8 | 0,0001 | 0 |
0,0000 |
|
4 |
B |
3 · 10-7 |
0,003 | 0 | 0,0000 | 0 |
0,0000 |
|
5 |
Bi |
2 · 10-6 |
0,02 | 0 | 0,0000 | 0 |
0,0000 |
|
6 |
Fe |
2 · 10-6 |
0,02 | 1,5 · 10-7 | 0,0015 | 0 |
0,0000 |
|
7 |
Au |
1 · 10-7 |
0,001 | — | — | — |
— |
|
8 |
K |
1 · 10-5 |
0,1 | 1,9 · 10-7 | 0,0019 | 1,3 · 10-7 |
0,0013 |
|
9 |
Ca |
5 · 10-6 |
0,05 | 8,9 · 10-7 | 0,0089 | 1,21 · 10-6 |
0,0121 |
|
10 |
Co |
5 · 10-7 |
0,005 | 1 · 10-8 | 0,0001 | 1 · 10-8 | 0,0001 |
|
11 |
Si |
1 · 10-3 |
10 | 1 · 10-7 | 0,0010 | 6 · 10-8 |
0,0006 |
|
12 |
Mg |
1 · 10-6 |
0,01 | 1,7 · 10-7 | 0,0017 | 1,8 · 10-7 |
0,0018 |
|
13 |
Mn |
1 · 10-6 |
0,01 | 0 | 0,0000 | 0 |
0,0000 |
|
14 |
Cu |
2 · 10-7 |
0,002 | 0 | 0,0000 | 1 · 10-8 |
0,0001 |
|
15 |
As |
5 · 10-6 |
0,05 | 8 · 10-8 | 0,0008 | 0 |
0,0000 |
|
16 |
Na |
1 · 10-5 |
0,1 | 1 · 10-7 | 0,0010 | 9 · 10-8 |
0,0009 |
|
17 |
Ni |
3 · 10-7 |
0,003 | 3 · 10-8 | 0,0003 | 0 |
0,0000 |
|
18 |
Pb |
5 · 10-7 |
0,005 | 0 | 0,0000 | 6 · 10-8 |
0,0006 |
|
19 |
Ag |
1 · 10-7 |
0,001 | 1 · 10-8 | 0,0001 | 0 |
0,0000 |
|
20 |
Sb |
5 · 10-7 |
0,005 | 0 | 0,0000 | 0 |
0,0000 |
|
21 |
Ti |
5 · 10-7 |
0,005 |
6 · 10-8 | 0,0006 | 2 · 10-8 |
0,0002 |
|
22 |
P |
3 · 10-6 |
0,03 | 0 | 0,0000 | 0 |
0,0000 |
|
23 |
Cr |
3 · 10-7 |
0,003 | 0 | 0,0000 | 0 |
0,0000 |
|
24 |
Zn |
1 · 10-6 |
0,01 | 7 · 10-8 | 0,0007 | 1,3 · 10-7 |
0,0013 |
| 25 |
S |
1 · 10-4 | 1,0 | 0 | 0,0000 | 0 |
0,0000 |
|
Purity of the main product (HF) : |
99,998 % | 99,999998 % |
99,999998 % |
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BRC Spectr offers a set of equipment for the purification of the initial HF acid to values of 99.999998%
Other equipment and control systems NPK Spectr LLC
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Hydrofluoric acid
Used for etching materials of the semiconductor industry (silicon and quartz wafers)
-
Modernization of heater unit for the machine for growing sapphire single crystals by Kyropoulos method
Is actual for machines for growing crystals with mass more 60 kg The main upgrade is to use a new type of heater.
-
Control systems for technological process of growing sapphire single crystal
During the last decades, three methods are mainly used for growing sapphire single crystals: horizontal directional crystallization (GDC), Kyropoulos and Stepanov. All methods are based on growing crystals from