Used for etching materials of the semiconductor industry (silicon and quartz wafers)
HF is used in integrated circuit technology for the local oxidation of the channel-limiting region.
Product Characteristics:
№ |
Name of indicator |
Raw material |
Test results |
||||
ТУ 2612-028-6988698-2014 | Sample No. 1 | Sample No. 2 | |||||
1 |
Mass fraction of hydrofluoric acid (HF),% |
46-49 |
49 |
49 |
|||
Mass fraction of impurities, not more than: |
|||||||
% |
ppm | % | ppm | % |
ppm |
||
2 |
Al |
3 · 10-6 |
0,03 | 7 · 10-8 | 0,0007 | 2 · 10-8 |
0,0002 |
3 |
Ba |
2 · 10-6 |
0,02 | 1 · 10-8 | 0,0001 | 0 |
0,0000 |
4 |
B |
3 · 10-7 |
0,003 | 0 | 0,0000 | 0 |
0,0000 |
5 |
Bi |
2 · 10-6 |
0,02 | 0 | 0,0000 | 0 |
0,0000 |
6 |
Fe |
2 · 10-6 |
0,02 | 1,5 · 10-7 | 0,0015 | 0 |
0,0000 |
7 |
Au |
1 · 10-7 |
0,001 | — | — | — |
— |
8 |
K |
1 · 10-5 |
0,1 | 1,9 · 10-7 | 0,0019 | 1,3 · 10-7 |
0,0013 |
9 |
Ca |
5 · 10-6 |
0,05 | 8,9 · 10-7 | 0,0089 | 1,21 · 10-6 |
0,0121 |
10 |
Co |
5 · 10-7 |
0,005 | 1 · 10-8 | 0,0001 | 1 · 10-8 | 0,0001 |
11 |
Si |
1 · 10-3 |
10 | 1 · 10-7 | 0,0010 | 6 · 10-8 |
0,0006 |
12 |
Mg |
1 · 10-6 |
0,01 | 1,7 · 10-7 | 0,0017 | 1,8 · 10-7 |
0,0018 |
13 |
Mn |
1 · 10-6 |
0,01 | 0 | 0,0000 | 0 |
0,0000 |
14 |
Cu |
2 · 10-7 |
0,002 | 0 | 0,0000 | 1 · 10-8 |
0,0001 |
15 |
As |
5 · 10-6 |
0,05 | 8 · 10-8 | 0,0008 | 0 |
0,0000 |
16 |
Na |
1 · 10-5 |
0,1 | 1 · 10-7 | 0,0010 | 9 · 10-8 |
0,0009 |
17 |
Ni |
3 · 10-7 |
0,003 | 3 · 10-8 | 0,0003 | 0 |
0,0000 |
18 |
Pb |
5 · 10-7 |
0,005 | 0 | 0,0000 | 6 · 10-8 |
0,0006 |
19 |
Ag |
1 · 10-7 |
0,001 | 1 · 10-8 | 0,0001 | 0 |
0,0000 |
20 |
Sb |
5 · 10-7 |
0,005 | 0 | 0,0000 | 0 |
0,0000 |
21 |
Ti |
5 · 10-7 |
0,005 |
6 · 10-8 | 0,0006 | 2 · 10-8 |
0,0002 |
22 |
P |
3 · 10-6 |
0,03 | 0 | 0,0000 | 0 |
0,0000 |
23 |
Cr |
3 · 10-7 |
0,003 | 0 | 0,0000 | 0 |
0,0000 |
24 |
Zn |
1 · 10-6 |
0,01 | 7 · 10-8 | 0,0007 | 1,3 · 10-7 |
0,0013 |
25 |
S |
1 · 10-4 | 1,0 | 0 | 0,0000 | 0 |
0,0000 |
Purity of the main product (HF) : |
99,998 % | 99,999998 % |
99,999998 % |
BRC Spectr offers a set of equipment for the purification of the initial HF acid to values of 99.999998%
Parts made from metal granules using 3D printing or gas-static pressing are used for medicine (implants, medical wires, surgical instruments), for aviation (disks, shafts, shells, complex shapes).
During the last decades, three methods are mainly used for growing sapphire single crystals: horizontal directional crystallization (GDC), Kyropoulos and Stepanov. All methods are based on growing crystals from
Used for etching materials of the semiconductor industry (silicon and quartz wafers)